The IIT 2018 (Ion Implantation Technology) is focused on the major challenges in current and emerging technologies related to the tools and processes for ion implantation, annealing of semiconductors, and non-semiconductors, implanted devices, metrology of implanted layers and devices, as well as methods related to ion implantation.
Entegris was pleased to be a sponsor, exhibitor and presenter during the 22nd International Conference on Ion Implantation Technology.
The IIT 2018 (Ion Implantation Technology) is focused on the major challenges in current and emerging technologies related to the tools and processes for ion implantation, annealing of semiconductors, and non-semiconductors, implanted devices, metrology of implanted layers and devices, as well as methods related to ion implantation.
Entegris was pleased to be a sponsor, exhibitor and presenter during the 22nd International Conference on Ion Implantation Technology.
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At Entegris, Innovation is no accident! We offer a broad range of sub-atmospheric gas delivery solutions, advanced R&D and manufacturing capabilities, unmatched worldwide technical expertise and first choice in safety.
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Entegris is offering e-chuck smart solutions through continuous technical innovation and collaboration for 20 years.
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We have safety, quality, supply chain, and implant expertise… We have SDS®4.
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Featured Posters
Electrostatic Chuck Technology – Tailored Wafer Contact Surface Design and Application
Learn about how wafer contact surface plays more and more important role as its material, structure and properties greatly affect e-chuck performance and device yield.
Source Materials and Methods for Gallium Ion Implantation
This poster evaluates different source materials and methods for Gallium ion implantation, including gas material, different sputtering targets and a variety of co-gases.
Next Generation Safe Delivery Source (SDS®4) Dopant Material Storage and Delivery Package
View this poster to learn about sub-atmospheric gas storage and delivery systems, referred to as SAGS Type 1 that have been used to stably and reversibly adsorb pure dopant gases on an adsorbent substrate contained within a cylinder.
Investigation of Various GeF4 Gas Mixtures forImprovement of Germanium Ion Implantation
In this poster, the various GeF4 gas mixture compositions for improving germanium ion implantation performance are evaluated.
Fluorine Beam Performance of Fluoride Dopant Gases and their Gas Mixtures
In this poster, the initial results of Fluorine (F) beam evaluation of BF3, SiF4 and GeF4 dopants along with their hydrogen mixtures for process improvement and tool productivity are presented.
Enriched 11 Boron Trifluoride and Hydrogen Mixture for Performance Improvement on Applied Materials E-500 Implanter.
This poster evaluates 11BF3 mixtures on Applied Materials (Varian) E-500 implanter to maximize the equipment performance.
Entegris presented the following posters at the IIT conference:
- P1-19 Source Materials and Methods for Gallium Ion Implantation
- P1-22 Enriched 11Boron Trifluoride (En11BF3) and Hydrogen (H2) Mixture for Performance Improvement on Applied Materials E-500 Implanter
- P1-28 Electrostatic Chuck Technology – New Wafer Contact Surface Design and Application
- P2-25 Investigation of Various GeF4 Gas Mixtures for Improvement of Germanium Ion Implantation
- P2-30 Next Generation Safe Delivery Source (SDS4) Dopant Material Storage and Delivery Package
- Fluorine Beam Performance of Fluoride Dopant Gases and their Gas Mixtures
SDS®2 Safe Delivery Source is one of the safest technologies available for delivering highly toxic gases. Designed using specially formulated carbon-based adsorbents in the form of small beads, SDS2 systems both store and deliver gas subatmospherically.
Products
SDS®3 Safe Delivery Source is the safest technology available for delivering highly toxic gases. Designed using specially formulated carbon-based adsorbents in the form of pucks, SDS3 systems both store and deliver gas subatmospherically.
The Vacuum Actuated Cylinder® (VAC) uses sets of valves and pressure regulators to store gas under pressure but deliver them subatmospherically. This is safer than a traditional high-pressure gas cylinder for the lesser toxic gases.
The PDS®-A gas package is used for high-volume gas applications and specialty processes. The package stores and delivers highly toxic gases subatmospherically, substantially reducing the risk of catastrophic gas release and providing a significant safety and equipment damage benefit.
The PDS®-V gas package is for high-volume uses and specialty processes. It stores gas under pressure, but delivers gases subatmospherically. It is based on our VAC® gas package technology platform.
The PDS®+100 technology is designed to store and deliver toxic gases at safer, lower pressure (100 psig) than typical high pressure cylinders. The PDS+100 gas cylinder utilizes an internally-mounted set-pressure regulator (SPR) to control cylinder output.
Leveraging proprietary coating technologies and innovative manufacturing capabilities, our electrostatic chucks offer a very flat clamped wafer surface, uniform thermal properties, improved gas-cooling, superior plasma erosion resistance and ultra-low particle and metal generation
Caerus™ 100 series is a family of aluminum-based oxide coatings that are deposited at low temperatures with superior film quality. Our Caerus coatings are highly conformal, dense, pinhole-free and exhibit homogeneous microstructure.