Clean Chemical Delivery
As logic devices go to smaller line widths, 3D NAND architectures increase layers, and DRAM memory density increases, sensitivity to contamination and defects have a greater impact on device performance. To achieve optimum wafer yield and reliability, the microelectronics industry needs to address the increased materials consumption requirements and material purity challenges from chemical manufacture to point of use.
We are in the unique position to help customers maintain a clean chemical delivery environment with contamination-controlled chemical packaging, filtration, pumps, and fluid handling products that will increase product yield and reduce financial loss.
Webinar
Effective Slurry Concentration Monitoring Using Refractive Index
Understanding the amount of solids in slurry is critical to determining an accurate Material Removal Rate for CMP solutions. Index of Refraction (IoR) technology enables concentration monitoring of turbid and non-conductive materials.
Join Tracy Gast, as he introduces a new liquid concentration monitor based on IoR technology that offers high accuracy and repeatability with an optional automated in situ window cleaner to ensure measure stability over time.
Featured White Paper
Reducing Contamination Points in Clean Chemical Delivery from Manufacture through Point of Use
This paper takes a closer look at ways to more comprehensively meet increasing purity specifications throughout chemical and device manufacturing.
Featured White Paper
Ensuring Purity and Safety: How to Select the Right Container System for Safe, Clean Chemical Delivery
This paper discusses the challenges chemical suppliers and fab managers face to ensure clean and safe chemical delivery and provides recommendations for how to overcome them.
Featured Videos
Clean Chemical Delivery
View the importance of clean chemical delivery throughout chemical and device manufacturing.
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Clean Chemical Delivery: Fluid Handling with SME Brett Reichow
Brett Reichow, VP fluid management, explains as particle sensitivities increase for more complex memory and logic devices, contamination mapping is a key step toward ensuring overall system cleanliness throughout the fluid stream. The entire semiconductor ecosystem stands to benefit from contamination-controlled products from chemical manufacture to point of use. Runtime: 02:12
Featured Pictogram
We help you maintain a clean chemical delivery environment with contamination-controlled chemical packaging, filtration, pumps, and fluid handling products that will increase product yield and reduce financial loss.
Our solutions are less prone to particle shedding and metallic ion contamination and help you maintain a clean environment from chemical manufacture through point of use.
Product Solutions
Mitigate Particle Contamination
Not all components are the same in terms of particle cleanliness and contamination. We understand the importance of resin selection and continued testing, and how to employ process controls to control purity consistency. It is important to select suppliers, like us, who have a proven understanding of fluoropolymer processing and how to control potential sources of contamination.
As technology expands, sensitivities to chemical contamination increase due to critical process parameters and higher aspect ratios. Invest in our contamination-controlled solutions that are less prone to particle shedding, minimize dead legs and entrapment areas, reduce particles generated by moving parts, and employ advanced filter membrane technology.
Reduce Leachable Metallic Contamination
It can take months for metal contaminants to leach out of materials. Reduce your risk by partnering with us. We are working to reduce contamination by researching ultra-clean PFA materials, performing metals extraction testing on our products, and optimizing our processes to reduce contamination. We invest in identifying where impurities may be introduced, and take corrective actions to prevent them, which is a critical first step in contamination reduction efforts.
Transport vessels and storage tanks
Whether transporting, storing or dispensing chemical in bulk or to the point of use, our FluoroPure® chemical containers, intermediate bulk containers, and Sentry® quick connect systemsare designed to maintain chemical integrity and not contaminate your process.
Chemicals can be susceptible to particle contamination that may be introduced during chemical transport or transfer from bulk chemical containers to smaller drums or transportation packs. Avoid this risk with our clean, contamination-controlled solutions. NOWPak® liner based systems bottles, canisters, and closures maintain chemical purity and help ensure safe transport, containment, and dispense of valuable, ultraclean process fluids.
Clean Fluid Management
Ultraclean PFA tubing
As chemical sits in miles of tubing or in re-circulation loops, it is vulnerable to shedding particles. Protect your valuable chemical from particle contamination with our FluoroLine® ultraclean PFA tubing, which has the lowest total metal extractables and the least amount of surface contamination.
Reduce contamination with fewer entrapment areas
Designed for use with corrosive chemicals, Integra® Plus WS valves provide unmatched purity in any fluid handling system. The weir-style design streamlines the flow path and eliminates dead volume, providing gentle flow while keeping the flow path clean and free from contaminants.
High-purity PFA connections maintain chemical purity
Extremely robust and clean, PrimeLock® fittings offer the most reliable connection technology on the market. The ultraclean, high-purity PFA design provides clean, non-contaminating reliability and safety within your system.
Constructed for contamination control
Precise, point-of-use chemical flow control is vital in ultrapure liquid chemical applications, and with DI water and slurry. It is imperative at the point of use, that contaminants are not introduced into the chemical and create defects on the wafer. Our InVue® integrated flow controllers, NT6510 and NT6520, are designed to minimize dead volume and fluid shear, reducing the possibility of process contamination. Fluorinated materials of construction protect chemical integrity, which helps to increase yield.
Process monitoring without intrusion or interruption
Detecting metal and process excursions that lead to metallic contamination is critical to maintaining a clean, chemical environment. Our InVue® concentration monitors monitor for chemical excursions in BEOL, FEOL, and sub-fab delivery chemical systems. Early visibility to impurities increases wafer throughput, reduces chemical costs and decreases scrap.
Advanced Membrane Technology
Sophisticated liquid filtration
Filter membrane technology has advanced to enable sub-10 nm particle removal, which is vital to improving overall operating efficiency and enabling leading-edge technologies. Oktolex™ membrane technology tailors the Impact® 8G filter membrane to target specific contaminants and achieve maximum removal efficiency, which helps to maintain a clean chemical environment.
Through novel polymer design, diverse membrane manufacturing techniques, and advanced cleaning technologies, our Torrento® X, Guardian™ PS, and QuickChange® NX filter solutions enable you to tailor your contamination control based on the chemicals used, and the conditions required.
Effectively remove metal contaminants
Cleaning process tools and components like photoresist dispense pumps can reduce the impact of metallic contamination. At advanced logic nodes, gel defects and microbridged circuits are detrimental to device yield. The use of our Purasol™ SP/SN solvent purifiers can be especially effective at removing both dissolved and colloidal metal contaminants from variety of ultrapure, polar, and non-polar solvents used in photoresist applications.
Featured Brochure
BrochureThis brochure identifies entire system solutions developed to help you meet increasing purity specifications throughout chemical and device manufacturing.