Join us!
Entegris is excited to celebrate the 50th anniversary of SEMI by coming together for the landmark virtual SEMICON West event.
Entegris guests are invited to join us during the event at our VIRTUAL EXHIBIT for free, and receive a discounted
All-In Pass.
Meet the Experts Stage
A New Collaborative Approach to Defectivity Challenges in the Automotive Industry
Join Wenge Yang, VP Market Strategy, on demand in the Advanced Materials and Packaging for Automotive track, where he will explore the ‘New Collaborative Approach’, a new model of engagement targeting contamination control to improve automotive defectivity and reliability.
The presentation will cover:
- Automotive industry challenges
- Latent defects and their impact on the ecosystem
- A good contamination control strategy
- A new model of engagement to reach the ppb level goal
Register Free for Live Events
Entegris is offering 5 live, free-to-attend webinars on a variety of topics during the course of the show. Register for the topics you are interested in below with or without an event pass.
Entegris Technology Forum
Acceleration of the Materials Era
RECORDED WEBINAR
Join Entegris SVP and Chief Technology Officer, Jim O’Neill as he discusses:
- Effects of COVID-19 on semiconductor growth
- Increasing materials intensity in the era of materials advancement and putting it all together
This presentation is moderated by Wenge Yang, VP of market strategy and includes live Q&A with Entegris technology experts.
Polishing Chemically Inert and Mechanically Hard Materials
RECORDED WEBINAR
As new materials are being introduced into semiconductor manufacturing, new CMP techniques are needed to address challenges with material hardness and chemical inertness.
In this webinar, Dr. Rajiv Singh, VP, CMP slurries, addresses methods to achieve high polish rates and enhanced surface finish in silicon carbide, gallium nitride, sapphire, and carbon-based materials.
Effective Slurry Concentration Monitoring Using Refractive Index
RECORDED WEBINAR
Understanding the amount of solids in slurry is critical to determining an accurate Material Removal Rate for CMP solutions. Index of Refraction (IoR) technology enables concentration monitoring of turbid and non-conductive materials.
Join Tracy Gast, as he introduces a new liquid concentration monitor based on IoR technology that offers high accuracy and repeatability with an optional automated in situ window cleaner to ensure measure stability over time.
Enabling Yield Advantages
RECORDED WEBINAR
A semiconductor manufacturer may have a fleet of FOUPs that handle wafers hundreds of times throughout the manufacturing process. These microenvironments are trusted to be free of contaminants and conductance, but like any other mechanical object they have parts that wear over time.
Join Yossi Lax, global service manager and technology specialist, to learn the best methods for properly maintaining FOUP fleets to increase yield.
Entegris Supply Chain Forum
RECORDED WEBINAR
Join Neil Richards, SVP global operations and supply chain, Sandy Gauthier, VP global supply management as they discuss:
- The purity roadmap for materials and filtration
- Navigating supply chain challenges resulting from COVID-19
- Collaboration and localization to ensure continuity
This presentation is followed by live Q&A with Entegris operational experts.
Explore Our Interactive Fab Application
New, advanced semiconductor chips are the building blocks for future innovation. Entegris uses advanced science to help leaders in the industry address key challenges and provides end-to-end solutions across the semiconductor fab. This app provides a complete view of how Entegris can help enable future innovations that start in the fab.
Explore NowAccess Free On Demand Webinars:
Antoine Amade, EMEA/NA senior director – Entegris Automotive Program, explores the ‘New Collaborative Approach’, a new model of engagement targeting contamination control to improve automotive defectivity and reliability.
Connor Gallegos, Product Manager, and Nilesh Gunda, Director, Coatings Product Technology, share the importance of advanced coatings for chamber parts and components, and highlight three successful coating methods.
Join Entegris’ SVP, CTO, Jim O’Neill in this webinar to learn about:
- Digital transformation and the demand for higher performance chips
- New, purer materials needed to deliver high-yield and long-term reliability
- Holistic materials and handling solutions to enable a new approach to the most challenging yield problems of advanced node technologies.
- Why is the industry moving away from stainless steel to PFA materials for transporting process fluids?
- How can you defend against dangerous ESD in fluid handling systems?
Join Dave Kemkes, Senior Product Marketing Manager, and Rick Lindblom, Director of Product Marketing Fluid Handling, as they discuss these topics and introduce Entegris’ new ESD solutions.
Jennifer Braggin, Strategic Applications Technologist at Entegris, highlights points in the photochemical ecosystem where variability can be addressed with chemistry and hardware solutions - from the purification of resist components to the final post develop rinse, there are many points at which defects can be created or eliminated.
Technical Resources
This paper describes how a collaboration between RECIF and Entegris resulted in new advanced purge capabilities that protect wafers when the FOUP is open. The solution was tested at imec through the ECSEL Joint Undertaking Collaborative Program.
Logic devices are getting smaller, and the introduction of 3D architectures that use vertical fins and nanowires in their gate design introduce more complexity to the fabrication process.
As the automotive paradigm shifts from mechanical to electronic-centric vehicles, carmakers must now meet parts per billion (ppb) failure rates. To achieve these goals and improve long-term reliability, they look to semiconductor manufacturers and the automotive component supply chain to collaborate in meeting these goals and assure the functional safety of new modes of transportation.
As process nodes continue to shrink to 5 nm and features become more complex — pushing the manufacturing challenges of chip designs to new limits — the sensitivity to contamination during manufacturing processes has increased significantly. To meet the needs of these applications, gas purity must extend through the full supply chain to prevent process excursions and improve device performance and reliability.
We’re debunking the contamination control myths to reduce your process variations. The lithographer’s toolkit provides a practical guide to reduce process variations that threaten your semiconductor fab performance.
As logic devices go to smaller line widths, 3D NAND architectures increase layers, and DRAM memory density increases, sensitivity to contamination and defects have a greater impact on device performance. To achieve optimum wafer yield and reliability, the microelectronics industry needs to address the increased materials consumption requirements and material purity challenges from chemical manufacture to point of use.
Extreme Ultraviolet reticle pods are highly-specialized pieces of equipment that fulfill a critical role in EUV lithography. They must protect the reticle during use, storage, and transportation while not introducing additional contamination or damage.
Protecting the purity, safety, and security of the wafers is paramount to your business.
Fortunately for semiconductor manufacturers, Entegris provides full container solutions to monitor, protect, transport, and deliver those valuable wafers from the front-end through to the back-end of the fab.
To mitigate the increased risks of ESD, we are developing a continuously conductive PFA system that collects the charge buildup from the media and the fluid handling system and allows an uninterrupted dissipation path to ground.
We provide solutions for surface preparation and integration including: pCMP cleans, post etch cleans, selective etch chemistries, CMP disks, and CMP brush solutions.
Semiconductor processing at advanced nodes requires extreme levels of cleanliness to minimize the risk of yield loss associated with submicroscopic contaminants. At Entegris, we understand these challenges and offer precision-engineered coatings that extend tool life while improving device yield.
With semiconductor nodes shrinking to 10 nm and below and once-flat architectures evolving into complex 3D structures, whole new paradigms in material deposition must be developed. Entegris takes a holistic approach to advanced material development, yielding industry-leading innovation.
Learn more about operational excellence at Entegris and our focus on material purity and preventing defects, our adherence to safety and environmental standards with technology such as SDS® cylinders, gas cabinets, and delivery systems, and our ability to supply locally.